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JEOL Ltd.. (4/10/15). "Press Release: Release of the New X-ray Photoelectron Spectrometer JPS-9030".
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Organisation | JEOL Ltd. (JP) |
Group | JEOL (Group) | |
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Product | JPS-9030 X-ray photoelectron spectrometer (JPS-9030 XPS) |
Product 2 | X-ray technology | |
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Person | Kurihara, Gon-emon (JEOL 201108 President) |
The definitive XPS for high-speed, high-precision depth profiling
JEOL Ltd. (President Gon-emon Kurihara) has completed the development of the X-ray Photoelectron Spectrometer (XPS) JPS-9030, with sales scheduled to start on April 10, 2015.
Product development background
In recent years, there has been a growing demand to perform high quality surface analysis quickly, easily and reproducibly on any kind of sample for any level user. The JPS-9030 is equipped with a newly-designed user interface that further improves operability and also debuts a sophisticated, new modern and sleek exterior design.
Main Features
1. Depth profiling optimized for the application
The newly-developed Kaufman-type etching ion source provides etching rates from 1 nm/min to 100 nm/min (SiO2 equivalent), and allows a wide range of settings. It is capable of depth profiles suitable for any application, from measurements demanding precision to processes that require speed. The mounting of the Kaufman-type etching ion source to the specimen exchange chamber facilitates prevention of contamination of the measurement chamber.
2. Newly-developed software provides even greater ease-of-use
SpecSurf Ver. 2.0 now incorporates a ribbon-style GUI, offering a user-friendly environment in which all operations can be performed with the mouse. With JEOL’s own automatic qualitative analysis function, it is possible to sequentially perform qualitative, quantitative and chemical state analyses for multiple acquisition points.
3. Ultra-high surface sensitivity
The JPS-9030 supports techniques like Angle-Resolved XPS (ARXPS) and Total Reflection XPS (TRXPS), and is capable ultra-high sensitive analysis of the top surfaces of 1 nm (standard measurement method 6 nm or more).
4. A wealth of options
Monochromatic X-ray sources
Argon gas cluster ion source suitable for organic samples
Infra-red heating system capable of temperatures of 1,000°C or higher
Transfer vessel to protect specimens from exposure to the atmosphere
Main Specifications
Intensity
(MgKa, 300W equivalent)
1,000,000 cps or more (at Ag3d5/2 FWHM is 1.0 eV)
X-ray source
Mg/Al twin anode
Input-lens system
Cylindrical electrostatic lens
Energy analyzer
Electrostatic hemispherical analyzer
Energy sweep method
Constant Analyzer Energy and Constant Retarding Ratio
Detector
multichannel plate
Ion gun
Kaufman type ion gun
Base pressure
7 × 10-8 Pa or better
Bake-out system
Built-in heater, automatic control
Annual unit sales target
20 units/year
JEOL Ltd.
JEOL is a world leader in electron optical equipment and instrumentation for high-end scientific and industrial research and development. Core product groups include electron microscopes (SEMs and TEMs), instruments for the semiconductor industry (electron beam lithography and a series of defect review and inspection tools), and analytical instruments including mass spectrometers, NMRs and ESRs.
For more information about JEOL Ltd. or any JEOL products, visit www.jeol.com.
Record changed: 2019-06-09 |
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